Exact(5)
The optimal parameter of plasma treatment was 60 W for 5 min in oxygen condition.
After deposition, the as-grown samples were annealed 40 min in oxygen flow at 300°C in a quartz tube.
Ni/Au was deposited on the transparent electrodes, and the transparent electrodes were annealed at 600°C for 3 min in oxygen ambient.
The Al particles were prepared by thermally treating the particles at 480 °C for time increments up to 180 min in oxygen and 90 min in argon.
Subsequently, these samples were annealed at 450 °C for 30 min in oxygen by rapid thermal processing (RTP) to remove organic components and allow grain nucleation and growth of the ZnO-NFs.
Similar(3)
A nearly Nernstian pH sensitivity of 54 57 mV/pH has been observed for O-terminated NCD films treated in an oxidising boiling mixture for 80 min and in oxygen plasma.
After the completion of every BaTiO3 layer,the sample was annealed about 30 min in the oxygen ambient pressure.
(15) The substrates were loaded into an ultrahigh vacuum chamber and heated at 950 °C for 30 min in an oxygen partial pressure (PO2) of 1 × 10−6 Torr prior to growth.
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