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Exact(8)
bias of 300 kHz (less than the ion plasma frequency value) was directly measured with a Pt wafer using a high voltage probe.
The characteristics of the plasmas were studied as a function of capillary aspect ratios, input power, electrode distance, He/O2 gas flow rate, etc., using a high voltage probe, current probe, and optical emission spectroscopy (OES).
Influence of system parameters such as RF power and discharge pressure on the negative self-bias voltage of substrate was systematically investigated by Oscilloscope with a high voltage probe.
Applied voltage and jet current were measured using a high voltage probe (Tektronix P6015 A) and a current probe (Tektronix TCPA-300).
The contact voltage across the wheel and strip was measured by a 1,000 1 high voltage probe (TPP0250, Tektronix), while the current was measured by a Rogowski coil (i400s, Fluke).
The measurements were made using a high voltage probe (Tektronix P6015A Tektronix Inc., Beaverton, OR, USA) and a current probe (Tektronix TCPA-300), and the results were recorded on a digital oscilloscope (Tektronix DPO-2012).
Similar(52)
The discharge voltage and current are measured with a high-voltage probe and a Rogowski coil, respectively, to determine whether the discharge is successful.
Discharge voltage was measured by a high-voltage probe connected between cathode and earth.
Discharge voltage was measured by a high-voltage probe connected between the cathode and the earth.
For determination of the temporal pinch zone, high-voltage probe is used.
A self-integrated Rogowsky coil and a high-voltage probe were used to measure the current and voltage waveforms, respectively.
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