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The antiplasticization of epoxy networks based on diglycidylether of bisphenol A (DGEBA) and hexamethylene diamine was investigated by both dynamic mechanical analysis and high-resolution solid-state 13C nuclear magnetic resonance (n.m.r).
The epoxy monomer was based on diglycidylether of bisphenol A (DGEBA) and the diamines were either 4,4′-methylenebis [3-chloro 2,6-diethylaniline] (MCDEA) and 4,4′-diaminodiphenylsulfone (DDS).
The purpose of the present study is to develop novel nanocomposites based on diglycidylether of bisphenol A (DGEBA) combined with diglycidylether-terminated polydimethylsiloxane (DG-PDMS), reinforced with 10 wt.% (mono-/octa) epoxy POSS nanocages (MEP or OEP-POSS).
The epoxy monomer was based on diglycidylether of bisphenol A (DGEBA) and the diamines were either 4,4′-methylenebis [3-chloro 2,6-diethylaniline] (MCDEA) or 4,4′-diaminodiphenyl-sulfone (DDS).
The water absorption characteristics of various networks based on diglycidylether of butane diol (DGEBD) and 3,5-diethyl-2,4-diaminotoluene 3,5-diethyl-2,4-diaminotoluene 3,5-diethyl-2,4-diaminotoluene 3,5-diethyl-2,4-diaminotoluene 91°C with studied in the 20–100°C temperamine/epoxide
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More than 90% of manufactured epoxy resins are based on the diglycidylether of bisphenol A (DGEBA) (fig. 1), while the remaining 10% non-DGEBA epoxy resins are based on the diglycidyl ethers of bisphenol F, cycloaliphatic compounds, or other more complex systems [ 2].
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