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The multilayers are characterized by various techniques including X-ray reflection (XRR), X-ray diffraction (XRD), scanning electron microscopy (SEM) and their mechanical properties were measured by nano-indentation and surface profilometry.
X-ray reflection.
x-ray reflection fluorescence spectroscopy.
X-ray reflection near 45° via multilayer mirrors can be used for astronomical polarization measurements.
(b) Specular X-ray reflection for the as-grown and annealed GaN QD/AlN SL structures.
X-Ray Reflection analysis (XRR) has been carried out to investigate the layer density and the multilayer structure.
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The correlation between the results obtained from these different X-ray reflections is excellent.
The observed X-ray reflections can be well indexed with lattice parameters of face-centered cubic (f.c.c).
The domain size, evaluated from the integrated width of the X-ray reflections, also increased drastically at these annealing temperatures.
Typical data are shown in Figure 1b, and the samples reveal a series of well-defined X-ray reflections in the 2θ range of 10° to 90°.
A nanocrystallization of Ti Ag–O film, characterized by low-intensity X-ray reflections from the anatase phase, is observed ataD ≤ 5.5 nm/min.
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