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FMM technology for medium-thick seam with thicknesses of 1.3 3.5 m is widely used both in China and abroad.
Additional examples of AIFs from the quenched Cu-Zr sample are shown in Fig. 2c,d with thicknesses of 2.2 and 2.7 nm, respectively.
Initial Pt layers with thicknesses of 0.5, 2, and 5 nm were selenized at low temperature using a TAC method, realizing robust PtSe2 layers with different thicknesses.
The mats were produced with thicknesses of 114 nm, 198 nm and 298 mm.
In dielectric films with thicknesses of only a few tens of nanometers, even a few volts can result in very strong electric fields on the scale of 106 V cm−1.
Plasma nitriding at 1073 K and 1173 K leads to the formation of TiN surface layers with thicknesses of 300 nm and 350 nm, respectively, above Cu3Ti3O layers with thicknesses of approximately 700 nm and 2200 nm.
50 mm diameter aluminum and steel discs with thicknesses of 10, 20 and 30 mm along with 70 mm diameter aluminum and steel discs with thicknesses of 10 and 30 mm were supplied.
For the core polyolefin (PP-PE) foils with thicknesses of 0.3 mm and 0.6 mm were used.
LiAlxOy films with thicknesses of 65 200 nm were deposited by the ALD technique on an Mg 10Li 0.5Zn alloy.
Solid oxide fuel cell electrolytes with thicknesses of approximately 30 μm were deposited by suspension plasma spraying.
Six printing passes were performed on each side to give anodes with thicknesses of ~10 μm.
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