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Fig. 11 Pulse width variation w.r.t control voltage.
We model CMOS channel length and width variation using i.i.d.i.d
sheath width variation in transversely magnetized capacitive coupled plasma.
The influence of the width variation of the dielectric stack is also taken into account.
Open image in new window Fig. 14 Computed σ and crack width variation.
In Figure 5, we have plotted the soliton width variation with the magnetic field.
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In most cases, the depth and width variations were strongly dependent on the profile angle variation.
Photogrammetry was used to detect tension crack and width variations of channels.
Their width variations may be taken as a measure of the degree of the disorder (or the concentration of defects).
Examples of high-resolution X-ray diffraction methods used to find the layer width variations of QWIPs grown by molecular beam epitaxy are reviewed.
The dynamic and steady-state responses of the system to step input changes as well as unmodeled base metal width variations were studied by simulation and experimentally.
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