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poly(dimethylsiloxane). reaction-diffusion wet stamping.
The reaction-diffusion wet stamping (RD-WETS) method uses a nanopatterned agarose stamp such as poly(dimethylsiloxane) (PDMS) in soft lithography.
In addition, the highly ordered porous alumina on Al foils with the help of prepatterned indentations by the above-mentioned wet stamping were fabricated.
Electrochemical wet stamping (E-WETS) was applied for selective deposition of Cu on n-Si(1 1 1) using an agarose stamp.
This paper presents a novel micromachining approach named electrochemical wet stamping (E-WETS) for the fabrication of microstructures on metals and semiconductors.
Fabrication of microstructures on gallium arsenide (GaAs) was investigated using electrochemical wet stamping (E-WETS) by limiting a selective anodic dissolution process in the contact area between a stamp and a GaAs substrate.
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Then, the wet stamp was set on Al substrate with a slight loading (0.01 MPa) to ensure a conformal contact with substrate.
Handling the wet stamp very gently, scrape off the remaining paper.
By means of using the diluted (2%) mixed acid solution as a chemical etchant, the wet soft stamp can indent nanoscale shallow concaves on aluminum without the need of excessive loading.
Wet the stamp pad.
When you wet the stamp pad, the water takes on its color.
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