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Graphene nanosheets were firstly deposited onto carbon electrode surface by electrochemistry reduction method.
Single SiNx and SiNx/SiOxNy multilayer films were firstly deposited on textured silicon wafer for optical performance evaluation.
Homogenous PDA layer were firstly deposited onto glass fiber mats (GFMs), facilitating the anchoring of ATRP initiators.
Thus, gradient TiO2 films were firstly deposited at 80 °C and subsequently at 60 °C for a varying duration to efficiently tune their thickness.
The substrates were firstly deposited with pure Ti film by magnetron sputtering and then plasma nitrided in an atmosphere of 40%N2 60%% H2 at 460 °C.
W interlayers were firstly deposited on Ti6Al4V substrates under different conditions by sputtering and diamond was then deposited on W-coated Ti6Al4V using the same HFCVD reactor.
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For ZnO NWs, Au film with 3 5 nm thickness was firstly deposited on the Si substrate by a sputtering deposition method.
A columnar Al film was firstly deposited in this work at the top of 7 wt.% yttria-stabilized zirconia (7YSZ) TBC by magnetron sputtering.
Ppy nanowires are firstly deposited on flexible carbon cloth by electrodeposition, then a thin sacrificial layer of ZnO and a thin shell of TiO2 are deposited uniformly on the surfaces of the nanowires.
Dendrite-like gold nanostructure was firstly deposited on the GC electrode via the potentiostatic method, and then platinum nanoparticles were decorated on the surface of gold substrate through chemical reduction deposition.
In e-i hybrid mode, conductive graphene nanocrystallited film was firstly deposited, and its surface Ra roughness was decreased from 15.7 to 0.063 nm after 5-min ion irradiation.
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CEO of Professional Science Editing for Scientists @ prosciediting.com