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PCR product was cleaned using WIZARD ® DNA cleaning kits (Promega), an adenylation reaction performed and cloned using TOPO TA cloning kits ® (Invitrogen).
DNA was cleaned using high template PCR cleaning kit (Roche), and 70 μg of DNA was obtained.
First, the SiC substrate was cleaned using a standard procedure for substrate cleaning [21].
Then, the membrane was cleaned using pure water and placed in a refrigerator.
Si wafer was cleaned using standard Radio Corporation of America (RCA) procedure.
The extracted RNA was cleaned using the RNeasy mini kit (Qiagen, Hilden Germany).
The wafer was cleaned using acetone in an ultrasonic bath for 10 min.
Before each deposition, the target surface was cleaned using 3000 laser pulses with a shutter shielding the substrate.
The silicon wafer was cleaned using acetone and 2-proponol, followed by short exposure to oxygen plasma.
The sample in Figure 5a was cleaned using steps one and two of the above procedure but without ultrasonic bath.
After laser processing, the specimen was cleaned using deionized water, in order to wipe off the residual copper salt.
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