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Inverse lithography attempts to synthesize the input mask which leads to the desired output wafer pattern by inverting the forward model from mask to wafer.
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A silicon wafer patterned with SU-8 photoresist served as a mold for PDMS devices.
The intricate pattern above is made of carbon nanotubes grown on a silicon wafer patterned with a catalyst.
This entire structure is built up on top of a silicon dioxide wafer patterned with back gates for the transistors.
The amount of amine contamination depends on the wet chemicals used, wafer patterning and the wafer storage conditions.
Illustrations of i t curve profiles during copper super-filling of complex wafer patterns in a potentiostatic mode are presented.
As an array of microelectrodes or a semiconductive silicon wafer patterned with microelectrodes were used as the working electrode, a dendritic network of cyrstalline oligopyrene nanosheets was fabricated.
To construct rectangular reaction channels, SU-8 2025 (Microchem Corp., MA) was spin-coated to form a 50-µm thick layer on a bare silicon wafer, patterned by UV exposure.
An 8 mm diameter and 0.12 mm thick gasket-like spacer (Invitrogen) was placed on top of the wafer patterned with pumps.
SEM images were used to characterize a single SERS particle on a silicon wafer patterned with gold-framed squares and numbers, which enabled the fast identification/localization of exactly the same particle under the optical/Raman microscope (Supporting Information Figure S3).
Based on our previous work, a soft polydimethylsiloxane (PDMS) mould was fabricated from a silica wafer patterned with unidirectional microchannels of 200 μm in width and separated by walls with 30 μm wide and 30 μm high.
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