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Fig. 1 a c Dependence of absorptance on different fabrication process with various implantation doses.
Thin layers of nanocrystalline FeSi2 embedded in Si structures have been formed by Fe implantation using a metal vapor vacuum arc (MEVVA) ion source under various implantation and thermal annealing conditions.
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Samples were retrieved at various times following implantation, MS removed from HF, and the amount of Dox remaining determined via ultraviolet/visible (UV/Vis) spectrophotometry.
Various constructs for implantation have been proposed in the pre-clinical literature.
The surfaces of spin-coated polystyrene (PS) on glass and silicone rubber (SR) were modified by carbon negative ion implantation with various ion doses from 0.1 to 10 × 1015 ions/cm2 at various ion energies from 5 to 30 keV.
4. Gather opinions from various people about the implantation and use of RFID chips and write newspaper articles based on those findings.
Considerable experience has been gained with various access routes for implantation and with valve-in-surgical bioprosthetic valve procedures.
The experiment focused on 20 30 keV Ar ion implantation in various plant tissues to doses ranging from 1014 to 1016 ions/cm2.
A study has been made of ion implantation of various kinds of ions into ePTFE membranes with fluenses of 1 × 1013, 1 × 1014, 1 × 1015, and 5 × 1015 ions/cm2.
The surface damage owing to removal of oxide particles from the titanium surface is reduced to various extents by different implantation conditions.
Low-energy (1 to 20 keV) ion implantation of various impurities into Si is commonly used to make super-shallow p-n junctions[1, 2] and to form a variety of quantum-sized objects[3, 4].
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