We found that variation of substrate biasing conditions critically affected film composition, structure and resultant mechanical properties.
So by varying different process parameters, such as chamber pressure, microwave power, gas flow rate and cavity lengths (by changing the probe, short and stage positions), the resultant variation of substrate surface temperature can be measured.
Variation of substrate biasing conditions provided coating structures that ranged from completely amorphous at floating substrate potential to nanocrystalline at Vs = −50 to −100 V and crystalline nanocolumnar at Vs = −150 V.
The chemical reaction, intrapore diffusion, non-isobaric viscous flow and variation of substrate pore geometry during deposition are considered in the model which is readily solved by the orthogonal collocation numerical technique.
The model equations comprising of simultaneous partial differential equations describing the temporal variation of substrate concentrations were simultaneously solved and regression was carried out to determine the optimal rate parameters.
The results show that the variation of substrate crystallographic orientation in the longitudinal section of the molten pool mainly influences the position of columnar to equiaxed transition, whereas in the transverse section it mainly influences the competitiveness of the preferred growth direction of columnar dendrites and the corresponding microstructure formation.
Figure S5 Variation of substrate temperature with filament temperature during the growth of the nanowires.
As a comparison, the effect of variation of substrate temperature on the sample nanostructure and chemical bond was also studied.
With further addition of nitrogen in the discharge, a slight variation of substrate current is found (Figure 4a).
As Figure 7a shows, the optical transmittance ratio at 400 ~ 700 nm is more than 90% for all thin films regardless of the variation of substrate temperature.
