Sentence examples for values of substrates from inspiring English sources
(a) Dissociation constants (K d values) of substrates (lauric acid, myristic acid, and palmitic acid) to CYP102A1 natural variants.
The K d values of substrates to the CYP102A1 variants were determined (at 23°C) by titrating 2.0 μM enzyme with the ligand, in a total volume of 1.0 ml of 100 mM potassium phosphate buffer (pH 7.4).
For the determination of the Km values of substrates, the concentrations of kaempferol and quercetin were varied from 20 to 100 μM, at a fixed UDP-glucose concentration of 2.5 mM and 7.0 μg of the purified enzyme.
Different values of substrate bias are employed.
The deposition was carried out at various values of substrate bias voltage and substrate rotation speed.
The EMF function can be obtained experimentally for zero current and different values of substrate at the steady state.
Additionally, the hydrogen production performance of the photobioreactor is evaluated based on the mean values of substrate consumption efficiency and hydrogen yield.
Subsequently, additional experiments were carried out with increasing the initial glycerol concentrations (ranging between 50 mM and 930 mM) in order to understand the threshold values of substrate inhibition (see Additional file 2).
To obtain tin oxide films with a high SnO2 proportion and a high texture in reactive oxygen sputtering, were necessary, relatively high values of substrate temperature, current and oxygen pressure.
It is necessary to note (see Fig. 3) high optical quality of Ge5As37S58 layers and Ge5As37S58 Se multilayer nanostructures (film transmission coincides with the substrate transmission in sites of interference maxima) and the presence of scattering in Se layer (transmission values of interference maxima for Se layers are smaller than values of substrate transmission).
For reactive magnetron-sputtering in Ar/N2 gas mixtures and using a hexagonal boron nitride (h-BN) target, we examined the values of substrate bias necessitated for the deposition of c-BN in correlation with the composition of sputter gas at a fixed radio-frequency (r.f).
