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After the epitaxial layers were grown, the wafers were cleaned using chemical solutions of trichloroethylene, acetone, methanol, and deionized water and dried by blowing N2 gas.
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This confirms the formation of heterojunction between TiO2 and HgS crystals deposited using chemical solution technique.
Distilled water was used to prepare chemical solutions of scale inhibitor in laboratory experiments.
Washing granite with the following method: Use a chemical solution of 1 part Citra-Solv to four parts water.
SPHs are prepared by cross-linking of monomer solution using chemical compounds in the presence of gas bubbles.
Avoid using chemicals and solutions used to remove liquid bandage on or near sensitive areas of skin, including the eye and genital areas and open wounds.
The use of the ligand is essential for controlling the size and the shape of resulting UCNPs using chemical reaction in a solution phase.
We demonstrate the catalyst-free growth of single-crystalline β-Na0.33V2O5 nanowires on a Pt-coated silicon substrate (Pt/SiO2/Si) using a chemical solution deposition method, the result of which is then used as a binder-free electrode for high-performance energy storage devices.
To test the effect of the dispersants on coral, the team exposed nubbins, or small branch clippings, of two coral species inhabiting the Red Sea--Stylophora pistillata and Pocillopora damicornis--to solutions of six commonly used chemical dispersants for 24 hours and then monitored the nubbins' health for 7 days.
Chemical methods involve use of chemical solutions such as surfactants, polymers, and caustic solutions, and gas methods involve injection of slugs of either CO2, N2, flue gas, or hydrocarbon to induce gas drive mechanisms within the reservoir (Shuker et al. 2012; Yassin 1988; Olajire 2014; Agi et al. 2018b).
Dry etching is a method in which a gaseous chemical etching agent is used to perform non-isotropic etching, but it is likely to destroy the surface and form defects. Wet etching uses a chemical solution to etch the surface of a semiconductor isotropically; the etching rate is a function of the temperature and concentration of the solution.
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