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The exposure of a pixel can be made to adapt to scene radiance by using an optical attenuator whose transmittance is computed based on the brightness measured by the pixel.
The excitation power was varied by using an optical attenuator.
BER performance of both downstream and the upstream are measured by varying the received optical power using an optical attenuator.
Back reflections were avoided using an optical isolator while the TL power was changed from 0 to 7 mW using an optical attenuator.
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Several micromachined optical attenuators have been introduced using an optical shutter between two optical fibers.
Displacement was monitored using an optical sensor with submicrometer sensitivity.
Samples were visualized using an optical microscope.
For intra-cavity losses adjustment to achieve stable dual-wavelength laser operation, an optical attenuator (OA) was inserted in the MMI-DWF arm containing the MMI filter 2 to add losses by curvature on the MMI filter with higher transmission.
MEMS technologies have successfully been applied to sensors [ 1, 2], actuators [ 3], microreactors [ 4, 5], radiofrequency devices [ 6], and optical devices such as an optical attenuator [ 7], an optical mirror array [ 8], an optical scanner array [ 9], and optical switches [ 10– 10].
An optical attenuator is used to adjust the intra-cavity losses for dual-wavelength laser generation.
The draughtsman uses an optical device constructed as a frame.
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