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Using an internal inductively coupled plasma (ICP -type-plasma enhanced vapor deposICP -type-plasmacrocrystallICP -type-plasma films wenhancedsited as a function of H2/SiH4 gas ratio at 180 °C.
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In conthist, the papera denewty and uniformethodre evidently improved by using more turns in the coil.
The metal concentrations were determined by using an inductively coupled plasma spectrometer ICP-75100, Shimadzu, Kyoto, Japan).
304 Austenitic stainless steel has been nitrided using an inductively coupled rf plasma.
Airborne lead and acidic gasses were analyzed using an inductively coupled plasma mass spectrometer and an ion chromatograph, respectively.
After photolithography, the porous films were patterned using an inductively coupled plasma reactive ion etcher (ICP-RIE).
Trace elements were quantified using an inductively coupled plasma optical emission spectrometer (iCAP 7500, Thermo Scientific, USA).
Serum copper and urinary copper concentrations were measured using an inductively coupled plasma optical emission spectrometer.
We quantified the arsenic using an inductively coupled plasma-mass spectrometer (6100DRC Plus; PerkinElmer Sciex, Concord, ON, Canada).
The concentrations of Fe, Y, and Zn were determined using an Agilent Technologies 7500c inductively coupled plasma mass spectrometer (Agilent Technologies, Santa Clara, CA).
We measured the concentrations of urinary metals using an Agilent 7700x inductively coupled plasma mass spectrometer with an octopole-based collision/reaction cell (Agilent Technologies).
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