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Next, a blanket of aluminum was evaporated on the Y2O3 film using a thermal evaporator (AUTO 306, Edwards).
Prior to the I-V measurement, gold electrodes (in circular shape, diameter of about 2 mm) were evaporated on top of the sample using a thermal evaporator.
Next, a Cu TE with a thickness of 100 nm was deposited using a thermal evaporator.
A Cu layer with a thickness of 40 nm was deposited using a thermal evaporator, and then, an Al layer with a thickness of approximately 160 nm was deposited in situ using a thermal evaporator.
Then, a Cu top electrode (TE) with a thickness of approximately 40 nm was deposited using a thermal evaporator.
Ag was deposited on the CuO nanostructures with various thicknesses from 10 to 80 nm using a thermal evaporator.
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Next, a 5 nm gold layer was evaporated onto the spheres with a thermal evaporator at a rate of 0.1 nm/s.
A thermal evaporator (Auto 306 Thermal Evaporator; Edwards High Vacuum International, Wilmington, MA, USA) was used to deposit a titanium/Au (500/3000 Å) layer on the SiO2/Si substrate.
A thermal evaporator (Thermal Co-evaporator, GEORIMTECH, Daegu, Korea) was utilized at the condition of <1.3 × 10−3 Pa and supplying voltage of 0.55 V.
The top Cu electrode of the control sample was deposited by a thermal evaporator.
Specimens of selected samples measured in the DSC were metallized in a thermal evaporator.
More suggestions(16)
using a centrifugal evaporator
using a thermal bag
using a thermal enhancement
using a thermal drill
using a thermal resistance
using a thermal inkjet
using a thermal release
using a thermal tape
using a thermal oxidization
using a thermal expansion
using a thermal feedback
using a thermal analysis
using a thermal circuit
using a thermal flame
using a rotary evaporator
using a thermal oxidation
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