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The components are fabricated using a single silicon device layer.
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The scintillation light from the crystal was viewed using a single 1×1 cm2 silicon PIN diode.
We propose a CMOS-compatible top-down fabrication technique of highly-ordered and periodic SiO2 nanostructures using a single amorphous silicon (α-Si) mask layer.
Using a single-crystalline silicon as the specimen material, the process parameters relevant to the hybrid process were investigated along with the interactions between the laser and waterjet.
Chromium nitride/chromium carbide (CrN/CrC) multilayers, with periods between 5 and 100 nm, were deposited on M2 steel and silicon substrates using a single cathode r.f.
Si C N films were deposited on p-type Si(100) substrates by dc magnetron co-sputtering of silicon and carbon using a single sputter target with variable Si/C area ratios in nitrogen argon mixtures.
LM proposed the novel top-down nanofabrication technique of silicon-based nanostructures using a single α-Si material, carried out the process development of highly controlled nanotrench, nanoline, and nanofin arrays, and drafted and revised the manuscript.
The silicon membrane is held in place using a single static trap directed at the attached functionalized bead.
Using a single booster.
Several beds of particles were used: a single bed of silicon particles, a double bed of silicon and alumina particles and a single bed of alumina particles.
The microsystem, consisting of an LC-oscillator and a frequency division module, is integrated onto a single silicon chip using a conventional complementary metal oxide semiconductor technology.
More suggestions(15)
using a single probe
using a single sample
using a single pair
using a single marker
using a single machine
using a single camera
using a single dose
using a single source
using a single protocol
using a single serum
using a single number
using a single model
using a single drug
using a single application
using a single specimen
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