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Due to limited atomic assembly kinetics during the deposition process (e.g., by using a low substrate temperature), defects (point-, line-, and area-defects), supersaturated, and metastable phases can easily be obtained.
On the contrary, a high conversion yield was accomplished by using a low substrate concentration (around 0.06 g/mL) and a high enzyme concentration (>233 IU/mL).
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CuS thin film was successfully grown on a conducting and non-conducting substrate using a low temperature, one pot, solution-process method.
Plasma polymeric coatings were applied to the surface of the pre-treated AM50 substrates using a low pressure plasma enhanced chemical vapor deposition (PECVD) technique.
SERS was measured on samples of different concentrations of Rhodamine 6G (R6G) on the AuNPs/graphene substrates using a low power 632.8 nm laser.
In this paper, thin films of tungsten are coated on 304 type stainless steel substrates using a low energy (1.6 kJ) plasma focus device.
ZnO Al (AZO) thin films have been deposited on glass substrates using a low plasma damage facing target sputtering (FTS) system with inductively coupled plasma (ICP) at low processing temperature.
Thin microfibrous substrates were built using a low cost, high speed, wet lay papermaking process with nickel and copper microfibers.
The growth of Al ZnO nanorods on a silicon substrate using a low-temperature thermal evaporation method is reported.
This device was grown on one side of a polished sapphire substrate using a low-temperature AlN buffer layer created by six-pocket multi-wafer system metalorganic chemical vapor deposition (MOCVD) with a vertical reactor.
Zinc telluride (ZnTe) thin films have been deposited on glass/conducting glass substrates using a low-cost electrodeposition method.
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