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Thin crystalline diamond films were deposited onto thin titanium foils using a hot filament chemical vapour deposition technique.
A possibility for the new synthesis method of diamond nanoparticles is studied using a hot filament chemical vapor deposition (HFCVD) reactor.
A one step procedure has been developed to grow beta-silicon carbide (β-SiC) nanorods from a solid carbon and silicon source on silicon substrates using a hot filament chemical vapor deposition.
Using a hot filament chemical vapour deposition reactor, diamond films of approximately 2 3 μm in thickness were deposited on tool steel specimens with three different interlayer systems, namely CrN, Si and borided steel.
Multiwalled Carbon nanotubes (MWCNT) with and without bamboo-like morphology were obtained on this catalytic ceramic dots using a hot filament CVD process based on CH4/Ar/H2 gas mixtures.
The influence of N2 Plasma Immersion Ion Implantation (PIII) on undoped nanocrystalline diamond (NCD) films grown on silicon substrate by CVD process using a hot filament reactor was systematically studied.
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Diamond films were synthesized by using a hot-filament chemical vapor deposition (HFCVD) reactor at a fixed gas mixture with varied deposition times.
In this work, the effects of two crucial parameters, namely deposition time and hydrogen flow rate on the growth of graphene using a hot-filament thermal chemical vapor deposition technique were systematically studied.
All films were deposited on Si wafers, AISI M2 high speed steel and AISI 316 stainless steel by reactive sputtering using a hot-filament-enhanced dc unbalanced magnetron system.
First, the tips employed in the dipping experiments were covered with amorphous carbon produced with chemical vapor deposition using a hot tungsten filament.
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