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Figure 4 R2P NIL using a flat mold with a roller press[33].
The imprinting concept is similar to the previous R2P NIL using a flat mold, with the exception that a flexible mold is wrapped around the roller for imprinting rather than a flat mold, as illustrated in Figure 7.
For P2P and R2P (using a flat mold) NIL processes, the micro/nanostructures are normally patterned onto rigid substrates such as silicon or quartz using conventional techniques (i.e., EBL) [3, 21, 22, 48] or even nanoimprint lithography [30], where the patterns are then etched into the substrate using reactive ion etching (RIE) to be used as a flat mold in the NIL process.
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Test panels were manufactured using a flat plate steel mold mounted on a press.
Figure 8 Process layout for the R2P NIL using a flat-type flexible mold proposed by Youn et al.[32].
Pry the molding completely away from the baseboard using a flat bar, then remove all the nails.
However, unlike P2P and R2P NIL processes which utilize a flat mold, continuous R2R and R2P (using a roller mold) NIL processes require a roller mold for imprinting.
Instead of using a flat substrate as the backing for attaching diamond grits, the substrate is prepared after the diamond grits are leveled on the surface of a mold.
Using a flat bobby pin helps.
Brush your hair using a flat brush.
Consider using a flat-iron.
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