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CrSiC and CrSiCN coatings were prepared using a closed field unbalanced magnetron sputtering system.
The films were deposited on nitrile rubber using a closed field unbalanced magnetron sputtering ion plating system.
In this paper, CrNiN coatings with differing Ni contents were deposited on tool steel substrates using a closed field unbalanced magnetron sputtering system.
Films resulting from Si additions to TiN matrix were prepared with Si contents in the range 0 19 at.%, using a closed field unbalanced DC magnetron sputtering system.
The ZrN/Zr/a-C multilayered coatings were deposited onto Ti6Al4V and Si substrates using a closed field unbalanced magnetron sputtering.
An a-C/a-C: Ti multilayer film with a bilayer period of 40 nm was deposited on medical Ti6Al4V alloy using a closed field unbalanced magnetron sputtering.
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Eight different coatings were deposited on stainless steel substrates using a closed-field unbalanced magnetron sputtering process.
Three different functionally graded amorphous carbon (a-C) thin films were deposited on to aluminium substrates using a closed-field unbalanced magnetron sputtering ion plating method.
The films were reactively sputtered from a composed target (a Si plate fixed by a Zr ring with inner diameter ØinZr = 20 mm) using a closed magnetic field dual magnetron system operated in AC pulse mode.
The article reports on properties of Al Si N films with a low (≤ 10 at.%) and high (≥ 25 at.%) Si content reactively sputtered using a closed magnetic field dual magnetron system operated in ac pulse mode.
Using a closed mating system and the field-based liquid nitrogen freeze-kill test [ 14] as a test of HB, we observed a significant enrichment of the trait over only three generations(P = .0002, F = 8.719, df = 2, one-way ANOVA of frequency distribution data).
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