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Bundles of single-wall carbon nanotubes (SWCNT) were synthesised using a chemical vapour deposition technique.
In this work, silicon carbide (SiC) coatings were produced on carbon/carbon composites using a chemical vapour deposition (CVD) method.
These oxide electrodes were laboratory-made films deposited on glass substrates using a chemical vapour deposition method, i.e. the aerosol pyrolysis technique.
Carbon nanotube (CNT) 'forests' were grown on a silicon substrate with a thermal oxide layer, using a chemical vapour deposition (CVD) process.
After densification using a chemical vapour infiltration, the resulting SiC/Si3N4/SiC composites showed excellent oxidation resistance, thermal conductivity of 4.32 6.62 Wm−1 K−1, ablation rate of 2.38 × 10−3 − 3.24 × 10−3 g cm−2 s and a flexural strength 43.12 55.33 MPa for a final density of 1.39 1.62 gcm−3.
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The experimental formation of aluminide coatings on 316 stainless steel grades and Ni by use of a chemical vapour deposition via the fluidised bed technique at relatively low temperatures (550, 560 and 570 °C for the steel and 550 650 °C for Ni) was studied.
A novel single-chamber thin film deposition process was developed for the fabrication of SiOx/parylene thin film multilayer structures, using a modified chemical vapour deposition (CVD) process.
The designed devices are easily realized by first growing the SnO2 NWs on Pt electrodes using a thermal chemical vapour deposition method and then spray coating the single-walled carbon nanotubes (SWCNTs) and/or multi-walled carbon nanotubes (MWCNTs) to make a connection between the two electrodes.
A chemical vapour deposition process using radio frequency induction heating operating at atmospheric pressure was developed for the deposition of ZrC coatings.
Nitrogen (N) was doped in situ in the nickel (Ni) nanoparticle (NP -dispersed carboNP -dispersed(carbonthat were grownanofiberstivated CNFson fiber (ACF) substhate, using catalytic chemical vapour deposition.
A semiconductor PbS quantum-dots-doped is fabricated using modified chemical vapour deposition in combination with atomic layer deposition.
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