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Langmuir Schaefer, 'layer-by-layer (LbL)' and self-assembling techniques were used to form thin films on solid surfaces.
This Self-assembled Nanophase Particle (SNAP) process can be used to form thin, dense protective organic surface treatment coatings on Al aerospace alloys.
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We fabricated a series of compliant, diseased carotid bifurcation models with eccentric stenosis (50%) and plaque ulceration (types I and III), and they were used to form thin-walled flow phantoms by coupling the vessels to an agar-based tissue-mimicking material.
This process is often used to form a thin (0.0001-mm) insulating layer of silicon dioxide.
Plasma polymerized allyl amine (ppAAm) is used to form a thin nitrogen-containing coating throughout porous three-dimensional (3-D) poly d,l-lactic acid) scaffolds.
Nafion solution (20 μL of 0.025 wt%) used to form a thin film on the catalyst monolayer and dried at 60 °C for 15 min in oven.
Second, a facile urea-based homogeneous precipitation method was used to form a thin uniform Y,Tb(OH CO3·n H2O layer on the surface of the Fe3O4 particles.
Amorphous selenium (Se) and, later, amorphous arsenic selenide (As2Se3) were used to form the thin-film, large-area photoconducting element that lies at the heart of the xerographic process.
Repetitive cycling in potential range −0.2 to 1.0 V was used to form of a thin nickel oxide film on the surface carbon composite electrode.
A low density of 5 mA/cm2 was used to form an upper thin porous layer with low porosity of about 30% and a higher density of 50 mA/cm2 to form a deeper layer with high porosity of about 60%.
A BLM chamber (BCH-1A from Eastern Sci LLC) was used to form horizontal membrane, and a thin Teflon film with an aperture of 70 120 μm (TP-01 from Easter Sci LLC) or 180 250 μm (TP-02) in diameter was used as a partition to separate the chamber into cis- and trans-compartments.
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