Sentence examples for unique deposition from inspiring English sources

The advantages provided by this method include unique deposition modes realized using high electric fields and complicated pressure injection due to high resistance at the nanopipette tip.

All substrates used in the experiment were mica with freshly cleaved surface (Ted Pella, Inc .. Unique deposition technique such as LB deposition is generally used to obtain films with controlled packing density of molecules over a wide range, which is not easily accomplished with chemisorbed or other assembling methods [20].

Then, numerous sub 3 nm Au nanoparticles were post encapsulated within STNVS nanostructures through the low-temperature hydrogen reduction based on the unique deposition-precipitation method with Au en 2Cl3 compounds as gold precursors.

The synthetic procedure involves the successive sol-gel template-assisted method for the preparation of uniform hierarchical hollow-in-hollow H-TS MCs with TiO2/mSiO2 as yolks/shells, and the unique deposition-precipitation method mediated with Au en 2Cl3 precursors for the in-situ construction of extremely stable Au NPs under a low-temperature hydrogen reduction.

The H2 annealing reduction based on the unique deposition-precipitation method mediated with Au en 2Cl3 compounds was post conducted to accomplish both the in-situ encapsulation of ultrasmall Au NPs and integration of inner entrapped Fe cores with strong magnetism.

The parallel structuring process combined with the unique energy deposition characteristics (small forward scattering, small penetration depth) makes ion projection a very efficient structuring process.

We hypothesised that a facet-selective surfactant adhesion, which is driven by the Ag+ via its unique underpotential deposition nature onto the nanoseed surface, could be the main factor for the formation of the structures.

The unique "aerosol deposition" in the ESD creates buffer voids in the electrode, ensuring fast infiltration of the electrolyte and releasing the internal stress of the electrode thus avoiding the cracking of thick electrodes.

A unique vapor phase deposition (VPD) technique was designed and built to achieve in situ CdCl2 treatment of CdTe film.

Graded SiO2 TiO2 binary composite films are prepared by a unique electro-assist deposition approach from a mixture of sol gel precursors containing tetramethoxysilane (TMOS) and titanium tetraisopropoxide (TTIP).

Given its relatively unique mechanism of deposition, the distinctive characteristics of this peat are presented in comparison to other peats reported in the literature highlighting its unique engineering behaviour.