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Hence, for practical fatigue design, it is expedient to specify an initial static trench profile to perform the dynamic simulations.
We successfully formed Si trenches with flat surfaces composed of terraces and steps while preserving the designed trench profile by increasing H2 pressure to 760 Torr.
This paper presents a new simple parametric formulation for delineating an initial trench profile, as there appears to be no such approach in the literature.
The effect of the deposition time and the density (number) of trenches on the wafer on (a) the species' consumption on the wafer and (b) the trench profile evolution is investigated.
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The importance of the feedback from the micro-scale (to the macro-scale) is demonstrated by comparing trench profiles produced with and without feedback.
A case study comparing the trenches obtained from seabed contact model, static analysis, and surrogate model, shows that the different trench profiles and the associated maximum fatigue damage are in close agreement.
Profiles (a), (b), (c) are perpendicular to the Japan Trench, and profile (d) is parallel to the trench.
Travel time and amplitude modeling are applied to ocean bottom hydrophones along two trench-parallel profiles, located 30 km (P21) and 35 km (P18) landward of the deformation front northeast of Quepos Plateau.
Jansen, H., Boer, M., Legtenberg, R. & Elwenspowk, M. The black silicon method: a universal method for determining the parameter setting of a fluorine-based reactive ion etcher in deep silicon trench etching with profile control.
In March 2007, after 12 years of irrigation, a profile trench observation method was used to map the number and the location of root distribution in clay loam (Luvisol) soil.
Control of ion energy is the key to obtain high mass density carbon films with keeping anisotropic deposition profile on trench substrates.
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