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Titanium oxide and titanium nitrogen gradient films were synthesized using plasma-immersion ion implantation and deposition (PIIID).
The improvement is believed to be related to the higher adhesion induced by ion mixing and formation of the surface layer incorporating titanium, nitrogen, and oxygen.
The dark region is a mixture containing titanium, nitrogen, and oxygen with varying concentrations and fluorine (F) in some locations.
Similar(57)
The macroscopic combustion regimes, as well as the dynamics of phase formation, for the titanium-nitrogen system at low nitrogen pressures (0.1 kPa < p < 50 kPa) have been studied.
The second technique is a typical MOCVD procedure which adopts Ti(Et2N 4 as a titanium and nitrogen precursor.
The films were mainly composed of titanium, carbon, nitrogen and oxygen.
The second technique is a typical MOCVD (metal organic chemical vapor deposition) procedure that uses Ti(Et2N 4 as a titanium and nitrogen precursor.
It was found that a surface zone rich in titanium and nitrogen was induced by the heat-treatment.
The applied pulse voltage formed nearly uniform implanted layer of the titanium and nitrogen ions all over the surfaces of the materials of three-dimensional shape.
The applied pulse voltage forms the implantation layer of the titanium and nitrogen ions all over the walls of the three-dimensional material of a simple shape.
The pulse voltage applied formed a nearly uniform implanted layer of titanium and nitrogen ions all over the surface of the materials of three-dimensional shape.
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