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This method increases the number of surfaces available for a better and quicker blending of flavors.
This method increases the rate of production up to about 1,200 rows of pile per minute.
Though, this method increases the hardware complexity cost.
However this method increases area and power consumption.
The computational cost of this method increases as function of the filter size.
However, this method increases the treatment period, and DO devices can cause discomfort.
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This method increased the reliability of transmission.
After that, research and development on this method increased significantly.
This method increased the channel current on/off ratio up to 105 in the SWCNT transistors.
However, this method increased the thickness of the etched SiO2 gate insulator which would be filled with high-k material.
The application of this method increased the P-removal efficiency up to 100% for 88 days at 30 °C.
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