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The book contains thin references to TISM.
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For the NL19 sample, which is composed of ultrathin sub-units (4.4 nm and 8.4 nm for SiO2 and TiO2, respectively) we observed a significant decrease of the IR refraction index for both types of sub-units; this points to a lesser mass density with respect to the thin film reference.
The XRD spectra of HAP and HAP 30% PA thin films, referenced to the ICDD standard for HAP (no. 01-072-1243), are shown in Figure 2.
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The reference thin Au film without a Ti underlayer exhibited significant grain growth during annealing, whereas no changes in microstructure of the Au layer were observed in the Au/Ti bilayers.
Inset is a spectrum of a reference ZnO thin film.
As a reference, MoS2 thin films were also deposited on intrinsic GaAs (i-GaAs) substrates under the same condition.
TiO2 NH arrays have been found to show much enhanced sensing performances compared to the reference (TiO2 thin film).
The obtained results are discussed, with particular reference to thin film electrodes stability under in vitro electrical stimulation in NaCl 0.9% (physiological serum).
For reference, a thin (120 nm) amorphous Ge film was deposited on quartz, and its Tauc plot (stars) is also reported with its fit.
Mechanical properties of bilayer graphene/poly methyl methacrylate) (GR/PMMA) and reference PMMA thin films are investigated using various macro, micro and nano mechanical test methods.
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