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Figure 3c shows the results obtained for the change in the thickness upon individual layer formation.
Microscopic analysis revealed changes in cell surface architecture and reduced thickness upon DTBP treatment.
The linear dependencies between interpore distance, pore diameter and wall thickness upon the anodizing potential were found.
The resonance can be gradually shifted up to 100 nm towards longer wavelengths by using atomic layer deposition of titania, from 3 to 100 nm in thickness, upon the film.
Particularly effective and significant was the response of the films (25 60 nm of thickness) upon exposure to TNT vapor (10 ppb): over 50% of fluorescence quenching was achieved in only 10 s.
The parametric dependence of the diffusion layer thickness upon electrode potential and scan rate has been derived for reversible electron transfer processes in linear sweep voltammetry (LSV) using a simple analytical expression for the dimensionless current function.
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The experiments show that the dissolution as well as the oxide layer thickness increase upon radiation.
Using a simple atomistic simulation, it is shown that the critical thickness depends upon the sign of the misfit.
Differential scanning calorimetry (DSC) was utilized to investigate changes in crystallinity and lamellar thickness distributions upon loading.
The nanosheets with {111}-planar surfaces and {112}-edge planes had a controllable thickness depending upon the deposition frequency and reduction/oxidation potentials.
Indents with residual depths of penetration less than the film thickness level upon heating above the glass transition temperature (Tg) of bulk PS.
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