Sentence examples for thickness exposure from inspiring English sources

Analyses showed that the two-factor interactions of luminance contrast and exposure time; luminance contrast and pictorial size; luminance contrast and slash thickness; exposure time and pictorial size; and pictorial size and slash thickness were significant.

Although CT and MRI are more accurate methods for the measurement of fat thickness, exposure to ionizing radiation of the former and the high cost of the later limit their usage.

Subsequent examinations by Auger spectroscopy proved the presence of thin layers of Cu2O on the copper surfaces, increasing in thickness with exposure time.

Particularly effective and significant was the response of the films (25 60 nm of thickness) upon exposure to TNT vapor (10 ppb): over 50% of fluorescence quenching was achieved in only 10 s.

Based on these experiments, development models of the coatings' equivalent concrete thickness with exposure time were obtained through regression analysis, and the carbonation depths of concrete with organic film coatings combined with the ageing of the coatings and repainting effects were obtained through numerical calculation.

A questionnaire method was developed and used in recording the displayed patient dose, compressed breast thickness and exposure factors.

This showed a large reduction in the remaining pellicle mass and thickness after exposure to 10 mM SDS (mass: 194 ± 171 ng cm−2; thickness: 2 ± 2 nm thick); but only a small change when the pellicle was exposed to 10 mM STP (911 ± 142 ng cm−2; 9 ± 1 nm thick).

This linear motif may extend indefinitely, generating one-dimensional superfilaments with an internal pattern of alternating A-rich and B-rich cores, as shown in the right panel of Figure 2. The fluctuations responsible for micelle size variation in the [AA] case here produce local defects in core thickness and exposure.

Inadequate compression in the blurred group (which would result in greater breast thickness, longer exposures and earlier selection of rhodium target/filter) is suspected.

To create a chalcogenide lithographic mask with specified parameters using IL, you must select the optimal thickness of photoresist, exposure time, selectivity of etchant, and time of the post-exposure etching.

They concluded that the efficiency is more than 35% when nanofluid volumetric receivers are coupled to a power cycle and optimized with respect to the optical thickness and solar exposure time.