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Exact(18)
For the scans under vacuum, the sample was heated from 213 to 363 K at 5 K min−1, during which XRD data were collected at a series of temperature points; the sample was held at each set point for 60 s before scanning for 600 s.
The sample was held in 4°C for 72 h.
While etching the SiO2 insulator, the sample was held at 40 °C.
After reaching 1,100 K, the sample was held for at least 12 h to reach textural equilibrium.
During preparation the sample was held at an angle of 57° which led to a more homogeneous wetting.
The sample was held in place with the clamp by applying a constant force of about 4.5 N to the sample.
Similar(42)
The sample is held between these two fixtures.
The ends of the sample were held by pneumatic grips (40 psi grip pressure).
The sample is held together with a few micron-sized chips of ruby, which are used as pressure gauge, and a pressure transmitting medium is loaded into the hole in the gasket.
The sampler was held over each fan coil unit, at about 1.5 m from the floor [ 17, 18].
The samples were held at constant length and heated to temperatures between 60 and 220°C with simultaneous recording of their thermomechanical response for up to 20 s.
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