Sentence examples for the same implantation from inspiring English sources

The observed broadband ranging from 506 to 599 cm−1also point out the same implantation effects as in C1 type.

Figure 3 shows the random RBS spectra of the samples with the same implantation current density at 2.0 μAcm-2 but different implantation fluences (<4.0 × 1016 cm-2).

However, FGF-2-mediated effects are more pronounced after co-transplantation with SC/DA cells mixed in one suspension at the same implantation side than in the side-by-side approach with a spatially and temporally separated transplantation of SC (day 1) and DA-cells (day 3).

The current work reaffirms the notion that different VEGF isoforms lead to distinct differences in tumour vascular structure when compared at the same implantation site.

The center of memory alloy orthopedic staples roachback was clamped by holding pliers and then implanted in the left and right side of each adjacent vertebrae of FSU from the anterolateral across the intervertebral space, the same implantation position with stainless steel staples.

Since the radiation conditions (kind and energy of implanted ions, radiation temperature and current density) were kept the same during implantation, the variation in the retention coefficient values as the dose of implanted deuterium exceeds 1 × 1017 D/cmaymay point to the increase of reemission and reflection characteristics of the steel samples themselves.

At the same time, implantation of an SPG stimulation system is a significant one-time investment for payers upfront, averaging more than €30,000 for implantation, when the costs of the device and the implantation procedure are considered.

A large amount of pyrrolic nitrogen is observed at the CNT tips compared to the amount at the CNT sidewalls for the same ion implantation parameters.

7 The amount and type of drugs were assumed to remain the same after implantation on a per patient base.

Eight goats were treated with a same implantation surgery, and three goats without surgery were set as blank group.

Following photoresist stripping, photolithography for implanting drain region was performed and As was implanted with the same condition as implantation for source region.