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The procedure was optimized to obtain a uniform layer of CNTs on the substrate.
The procedure was optimized for the flow rate of NaBH4, NaBH4 and hydrochloric acid concentrations using a full two-level factorial and also a Box-Behnken design.
The procedure was optimized in order to obtain stable and homogeneous particles with a small mean particle size (∼3 μm) and a narrow particle size distribution.
The procedure was optimized by means of an experimental design and under the optima conditions it showed satisfactory linearity, repeatability and intermediate precision.
The procedure was optimized by repeating the pyrolysis on the reference succinite at different temperatures within a range of 450 to 600°C.
However, the procedure was optimized for CMT-W1M cell line.
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Stearic acid concentration and other experimental parameters of the procedure were optimized.
The extraction procedure was optimized using the multivariate optimization approach following a two-stage process.
At the same time, the derivatization procedure was optimized testing three silylating reagents.
The manufacturing procedure was optimized such that the edges of the microchips were defined with a precision of ±10 µm with respect to the silicon nitride windows.
The pretreatment procedure was optimized by accounting for the chemical nature of the substrate, with the results indicating that additional pretreatment steps enhanced the self-ordered porous arrangement.
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