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Micromolding processes are replication-based processes, involving feature-transferring mechanisms, e.g., injection, compression, casting and intrusion, for replicating the master pattern on a mold to a plastic material.
The master pattern had hexagonal arrays of nanopillars, whose diameter and spacing between nearest neighbors were 150 and 300 nm, respectively.
We used deep ultraviolet (DUV) lithography and subsequent RIE to fabricate the master pattern with a hexagonal array of nano-sized holes, which were 300 nm deep and 270 nm in diameter.
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As can be seen, the initial height of the silicon master pattern of 94.1 ± 1.6 nm decreases after the first OrmoStamp copy to a value of 90.1 ± 1.1 nm which corresponds to a shrinkage of −4.3%%.
The silicon master pattern was then replicated onto a polytetrafluoroethylene (PTFE) polymer stamp by UV nanoimprinting to obtain the inverse pattern profile (i.e., an array of nanopillars).
The Si master pattern was replicated on a polyurethane acrylate-based custom-made UV-curable resin (PUA) on a polyethylene terephthalate (PET) film, which was used as the NI mold.
First, the Si master pattern was fabricated by KrF optical lithography (NRS-S203B, Nikon, Shinagawa, Tokyo, Japan), followed by reactive ion etching (Exelan HPT, Lam Research Corporation, Fremont, California, USA), at the National Nanofab Center in Korea.
The first step was the preparation of a silicon master pattern.
The three master patterns, each 5" on a side, were made from ABS plastic with this layered manufacturing technique.
The patterned hydrogel was prepared via the polymerization of acrylamide at room temperature with a silicon master pattern floating on top of the prepolymer solution.
By UV nanoimprinting the PDMS mold into the ZnO NP layer, a high-fidelity replication of the master stamp pattern was achieved.
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