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During the etching process, flammable hydrogen gas is also produced.
The etching process was fully investigated.
The etching process was characterized with a statistical experimental design.
Development in water then removes the coating from the unwanted areas of metal, exposing the metal for the etching process.
Engraving and enameling are often used in conjunction with the etching process to enhance the decorative design.
This two layers architecture is not modified by the etching process.
The etching process and the morphologies of the obtained structure are controlled.
The etching process creates channels that extend 2.5 μm beyond the mask features, resulting in oval shaped channels that are 5 μm wider than their depth.
With addition of the SF6 to the plasma the etching process is enhanced.
Surface structures can be controlled by changing the voltage applied during the etching process.
The etching process induces formation of stochastic nanostructures on the surfaces.
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