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The distance between the substrate and target was kept at 7 cm [15].
Reward for reaching the target was kept at one and the slope of the distant dependent reward was varied from 0.86 (almost reaching one, the value of the touch reward) at the border of the target for the steepest slope to down to 0.05 for the shallowest slope.
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In this study, both RF powers applied to the ZnO and MgO targets were kept at a constant of 80 W, and sapphire substrates were held at 600 °C.
We used a target controlled infusion of propofol and the target was kept unchanged at 4 μg/ml in each patient during the maintenance of anesthesia for the entire study period.
The sputtering power of carbon target (PC) was kept at the constant 150 W, while the sputtering power of titanium target (PTi) was changed between 5 W and 150 W.
The beam current density was controlled under 119 μA/cm2 [12,29], and the work pressure in the target chamber was kept at 1.5 × 10−2 Pa.
The distance between target and substrate was kept at 7 cm.
The distance between the target and substrates was kept at 10 cm and the substrate was rotated at a uniform rate during the deposition.
The distance between the target and the substrate was kept at 7 cm.
A distance between the target center and the sample substrate was kept at 9.5 cm, and we manually tilted the sample substrate with angle measurement.
During growth, the substrate temperature was kept at 700 °C, and the target-substrate distance was 6.5 cm.
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CEO of Professional Science Editing for Scientists @ prosciediting.com