Sentence examples for surrounding panels from inspiring English sources

The low horizontal etch rate contributes to a long etching time to release the surrounding panels.

The RIE process is responsible for not only triggering grain coalescence but also releasing the surrounding panels from the substrate.

Therefore, for self-assembly of 3D nanostructures, the ratio of vertical etch rate over horizontal etch rate needs to be tuned to generate enough heat energy while only the surrounding panels are completely released.

Sufficient grain coalescence should be triggered while the surrounding panels are released; however, the central panel should still be connected to the substrate until the structure is completely folded.

On the other hand, if the horizontal etching rate is much lower than the vertical etching rate, the surrounding panels will not be released during the Sn grain coalescence, resulting in unfolded structures.

During this process, a large amount of Si can be etched because of the long etching time and relatively high vertical etching rate, making the Sn hinge completely melt and disperse away from the panels before the surrounding panels are released.

Earlier this summer at the Produced By Conference, an annual gathering in L.A. to discuss the state of creating content, only a couple of the panels were dedicated to touting theatrical releases, but the majority of the buzz surrounded panels on new media.

Three couches, or clinia (hence triclinium, the Roman name for dining room) would have been arranged on a U-shaped geometric mosaic border surrounding pictorial panels arranged in a T. Guests entering the room would have walked on a panel illustrating a drinking contest between Dionysius and Hercules, flanked on either side by a dancing maenad and satyr.

To utilize grain coalescence for triggering self-assembly of 3D nanostructures, 20-nm-thick nickel (Ni) 2D nets with five square nanoscale panels (with dimensions of ~500 × 500 nm2) were first defined, with "UMN" lettered patterns on the surrounding four panels, on a Si wafer by an electron beam lithography (EBL) process.

The large water volume surrounding the panels acts as a temperature buffer and can be cooled or heated via a heat exchanger (Fig.  4).

If you're going too high, you risk damaging the lens by adding scuffs and hitting paint on surrounding painted panels.