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The substrates were then left to dry.
The nanotip pre-patterned Si substrates were then formed.
The pre-coated substrates were then horizontally immersed inside the beaker containing the growth precursors.
The substrates were then immersed in a diluted hydrofluoric acid solution (HF H2O = 1 9).
Fe-coated Si substrates were then loaded into the reactor chamber for growth process.
The Fe-coated substrates were then loaded into the MPECVD reactor for growth process.
These substrates were then analysed with XPS, AFM and Raman spectroscopy.
The substrates were then thoroughly rinsed with de-ionized water and dried in air.
The Si substrates were then rinsed in deionized water for several times.
The substrates were then dried in a vacuum oven for 12 h at 60 °C.
The substrates were then chlorinated in a saturated solution of PCl5 with benzyl peroxide in anhydrous benzene.
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