Sentence examples for substrates were implanted from inspiring English sources

SE 508 substrates were implanted at elevated temperatures with oxygen.

Fused silica substrates were implanted with: (1) phosphorus only, (2) indium only, and (3) phosphorus plus indium ions.

6H-SiC (0001) monocrystal substrates were implanted with 20 keV Pd ions at three doses of 5 × 1015, 5 × 1016 and 5 × 1017 ions/cm2 at room temperature.

The substrates were implanted at various temperatures ranging from 450 to 650 °C with 1.2 keV nitrogen ions using a very-high current density up to 0.5 A/cm2 ion beams.

B ions into Mg and Mg ions into B substrates were implanted in triple mode, i.e. each sample was sequentially implanted at three different energies starting from the highest one (80 150 keV range) to the lowest one (40 70 keV range).

This 2-layer structure inside the coating is more pronounced if the substrate is implanted with metal ions prior to the deposition.

Single crystal gallium antimonide substrate was implanted with 200 keV iron ions with different ion fluences varying from 1 × 1014 to 1 × 1016 cm− 2.

Substrates of polymethyl methacrylate (PMMA) were implanted with Ag− and Cu− of 60 keV at 3 μA/cm2 up to 3×1017 ions/cm2.

To further investigate the osteogenic capacity, hMSCs on microtextured substrates under different biochemical stimuli were implanted into subcutaneous pockets on the dorsal aspect of immunocompromised mice to study capacity for ectopic bone formation.

In order to improve photocatalytic property of rutile TiO2, metal negative ions were implanted to rutile substrates, and their optical absorption and photocatalytic efficiencies were investigated.

Titanium ions were implanted into silicon substrates which adhered to the material of three-dimensional shapes, such as trench and sphere, and the titanium nitride films were deposited on the substrate by plasma-based ion implantation using a titanium vacuum arc in nitrogen gas.