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In the manufacturing steps of carbon black/graphite based monolithic device (see Figure 1b), the FTO glass substrates were firstly etched with a laser to form two detached electrode patterns before being cleaned ultrasonically with ethanol.
The substrates were firstly coated with a pure Cr layer by cathodic triode sputtering and then borosiliconized according to a two-step pack cementation process.
The substrates were firstly deposited with pure Ti film by magnetron sputtering and then plasma nitrided in an atmosphere of 40%N2 60%% H2 at 460 °C.
Commercial single-crystalline Si substrates were firstly cleaned in acetone for 10 min by ultrasonication.
The substrates were firstly cleaned by sonication in acetone, ethanol, isopropanol, and deionized water for 5 min, respectively.
The substrates were firstly outgassed at 280 °C in the preparation chamber, then thermally cleaned at 940 °C for 15 min in the growth chamber.
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Theoretical models of a gecko seta adhering on different substrates are firstly established in order to disclose such an adhesion mechanism.
The effect of the surface pre-treatment on the silicon nitride substrates was firstly evaluated revealing that flat lapping mechanical treatment combined with chemical CF4 plasma etching is the best surface preparation to achieve high adhesion levels.
Prior to the growth of these doped thin films, the growth of undoped ZnTe thin films on semi-insulating GaAs (001) substrates was firstly optimized by tuning the temperatures of both the Zn and Te effusion cells as well as the substrate.
Specifically, in the presence of target nuclease, the DNA substrate was firstly degraded as mononucleotides and oligonucleotide fragments.
The Ag nanoparticle arrays on copper substrate are firstly prepared by a displacement reaction at mild temperature of 303K.
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