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The substrates were characterised by 24 physico-chemical and structural descriptors.
The substrates were characterised by X-ray mapping (SEM/EDX), mercury porosimetry and krypton adsorption.
Here, 28 T. delbrueckii strains from various substrates were characterised using different PCR-fingerprinting molecular methods: random amplified polymorphic DNA with polymerase chain reaction (RAPD-PCR), minisatellites SED1, AGA1, DAN4 and the newly designed T. delbrueckii (Td PIR, and microsatellites (GAC 5 and (GTG 5.
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In addition, the co-composted substrates are characterised by the abundance of thermotolerant fungi.
Graphene deposited by Chemical Vapour Deposition on different copper substrates was characterised using Near Edge X-ray andorption Fine Structure and X-ray Photoelectron spectroscopies.
The results show that coated substrates are characterised by under half the corrosion potential and 10-times lower corrosion current density compared to the reference substrate (without coating).
The morphology of the plasma polymer surface and its interface to the metal substrate were characterised using atomic force microscopy (AFM).
Field-effect transistors, fabricated by vacuum deposition of 28 onto an octadecyltrichlorosilane-treated SiO2 substrate, were characterised by XRD and AFM.
In this work, residual stress fields across a wedge-indented nanocrystalline CrN Cr thin film with a respective sublayer thickness of 500 nm and 250 nm and an overall thickness of 3 μm on a steel substrate are characterised ex situ, using cross-sectional synchrotron X-ray nanodiffraction with a spatial resolution of 100 nm.
The splat morphology and splat-substrate interfaces were characterised using FIB and TEM.
The films deposition was performed at room temperature and 500 °C on glass or Si substrates and the films were characterised by different techniques, i.e., Scanning and Transmission Electron Microscopy, X-Ray Diffraction, Atomic Force Microscopy and X-ray Photoelectron Spectroscopy.
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