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Then, they were used to fabricate TCEs on flexible PET substrates using the Meyer rod technique.
Much higher density of the Au NPs were found on ITO substrates using the centrifugation method.
Thin TiO2 films are deposited on FTO substrates using the EPD technique (Figure 1).
MoS2 thin films were deposited on (100 -oriented GaAs substrates using the DC magnetron sputtering technique.
And then, the ready solution was coated on quartz substrates using the spin-coating technique, as shown in Figure 2b.
First of all, Bi nanowires were grown on thermally oxidized Si (100) substrates using the OFF-ON method.
The TiO2-CNT hybrids were released from the substrates using the same methodology as that of the palladium composites.
First, ZnO NWs were grown on Si substrates using the previously reported ammonia solution method [32, 33].
Ni-based coatings were deposited on the substrates using the atmosphere plasma spray technology.
These coatings were deposited on stainless steel substrates using the HVOF thermal spray process.
Films are deposited on fused quartz substrates using the precursor gas trimethylsilane (TrMS).
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