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Pictures of the obtained graphene films on quartz substrates under different times are shown in Figure 1.
Polar and nonpolar ZnO thin films were deposited on MgO (001) substrates under different deposition parameters using oxygen plasma-assisted molecular beam epitaxy (MBE).
This research is carried out to understand the structure and characteristics of ZnO grown on sapphire substrates under different chamber pressures and VI/II ratios.
Several workers have tested a number of substrates under different operational conditions and brought forward the many positive process performance features and identified the main sources of inhibition.
The objective of this study is to present a new flexible-characteristic inspection system (FCIS) for measuring bending characteristics of flexible substrates under different bending conditions.
W interlayers were firstly deposited on Ti6Al4V substrates under different conditions by sputtering and diamond was then deposited on W-coated Ti6Al4V using the same HFCVD reactor.
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Figure 3 XRD patterns of Ag-TCNQ nanostructures on Si, substrate under different temperatures, respectively.
Figure 4 FESEM images of CdS films grown on Ni-covered Si(100) substrate under different laser pulse energy.
The interface between AAM coating layer and OPC substrate under different curing conditions was examined, further providing valuable application guidance.
The kinetic parameters of Spr Cel8A were assayed under optimal pH and temperature conditions with CMC as the substrate, under different concentrations ranging from 0.2 to 1.2 mg/mL.
To optimize operating parameters, the comprehensive three-dimensional computational simulations have been performed to study the temperature distribution, species mixing process and AlN deposition rate distribution on the substrate under different geometrical configurations and operating conditions.
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