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Our group has developed methods to sculpture nanostructures into high purity monocrystalline diamond substrates grown by CVD.
Different device types are realized using different transistor substrates grown by molecular beam epitaxy.
The electrical performance of devices fabricated on thin virtual substrates grown by two different techniques is presented.
We investigate surface, structural and optical properties of 1.3 μm metamorphic InGaAs quantum wells (QWs) on GaAs substrates grown by molecular beam epitaxy.
In this paper, we report AlGaAsSb/InGaAsSb heterojunction p i n photodetectors lattice-matched to GaSb substrates grown by solid source molecular beam epitaxy using As and Sb valved crackers.
Figure 4 shows a cross-sectional bright-field TEM image of a 10-nm-thick GZO film deposited on glass substrates grown by IP with dc arc discharge.
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ZnO film with p-type conduction has been successfully prepared on the GaAs substrate grown by MOCVD process and by subsequent thermal annealing.
Then, an activation experiment is performed on high quality p-type Mg-doped reflection-mode GaN substrate grown by metal organic chemical vapor deposition (MOCVD), the photocurrent is controlled and monitored by multi-information on-line monitoring system, the results are consistent with our calculation models.
Fig. 4 Cross-sectional bright-field TEM image of a 10-nm-thick GZO film deposited on a glass substrate grown by IP with dc arc discharge.
While waiting for hydrothermal synthesis to finish and the reactor to cool down to room temperature, the FTO substrate grown by TiO2 NRAs was taken out, carefully washed by DI water, and dried using N2 gas flow.
The effects of ex-situ annealing in a N2 ambient on the properties of GaAs/GaAsSbN/GaAs core-multi-shell nanowires on Si (111) substrate grown by self-catalyzed molecular beam epitaxy (MBE) are reported.
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