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Stripes were patterned onto graphitized SiC substrates by optical lithography.
transparent substrates by LB-nTM using an Ag nanoparticle solution.
(100) GaAs substrates by metal-organic vapor phase epitaxy (MOVPE).
PET substrates by LB-nTM using an Ag-nanoparticle solution.
The films were prepared on Ti substrates by spin-coating.
The films have been deposited on quartz substrates by r.f.
AlCuFeB coatings were deposited on different substrates by magnetron sputtering.
TiB2 coatings were deposited onto cemented carbide substrates by d.c.
Colloidal CdS quantum dots were directly deposited on glass substrates by a spin-coating process.
Eu2O3/Si multilayer nanostructured films are deposited on Si substrates by magnetron sputtering.
Pure MoS2 and Er: MoS2 samples were fabricated on Si substrates by chemical vapor deposition (CVD).
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