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MnO thin films were grown on Cu-foil substrates at various temperatures by the pulsed laser deposition (PLD) technique.
Oxide heterostructures composed of ferromagnetic La0.7Ba0.3MnO3 (LBMO) spacers and paramagnetic LaNiO3 (LNO) spacers were grown on SrTiO3 (0 0 1) substrates at various substrate temperatures.
TiAlN coatings with a Ti interlayer were deposited by arc ion plating (AIP) on 2024 Al/SiCp substrates at various nitrogen flow rates.
The depositions of TiB2 were carried out on nickel substrates at various current densities (50 150 mA/cm2), temperatures (800 1000 °C), and durations (30 360 min).
GZO films were prepared on glass substrates at various Ts in the range from 150 to 400 °C by ion-plating method with DC arc discharge.
1.5 MeV Au2+ ions were implanted into Si(1 1 1) substrates at various fluences at low currents (0.02 0.04 μA cm−2) while the samples were kept at room temperature.
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CrN coatings have been grown by arc ion plating (AIP) onto Ti6Al4V alloy substrate at various nitrogen pressures (PN2).
The mixed electrode was fabricated by electrodeposition of Co2O3 on to NiO substrate at various potentials of 0.8, 1.0 and 1.2 V vs Ag/AgCl reference electrode.
Chemical bath deposition (CBD) was performed to grow rutile TiO2 nanorods on Si substrate at various pH values (0.5, 0.7 and 0.9).
X-ray photoelectron spectroscopy and scanning electronic microscopy were employed to detect the change of chemical composition and surface morphology of Mg alloy substrate at various stages of surface modification.
A continuous wave CO2 laser beam with the power of 2200 W was irradiated to the preplaced mixture powder on the substrate at various defocused distance of laser beam (30 150 mm up on the substrate) at the constant traveling speed (100 mm/min) in the argon gas shielding.
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