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SERS substrates have been fabricated without nanolithography techniques by applying the maskless reactive ion etching (RIE) of silicon substrates, as shown in Fig. 10a [66].
One such example consists of few-layer CVD grown graphene films transferred onto elastic substrates, as shown in the left panel of Figure 12b [240].
By introducing Zn source in the growth of InN, we can obtain dense InN nanorods on bare glass substrates, as shown in Fig. 1b.
MoS2 thin films deposited on sapphire substrates are light yellow-green in color exhibiting obvious color contrast with transparent bare sapphire substrates as shown in Fig. 1a.
Thiol moieties exposed out of the ZIF-8 surface after cysteamine modification, results in the formation of thiol bonds with Au conductive substrates as shown via Cyclic Voltammetry experiments.
On the other hand, a decreased interface roughness of 0.05 to 0.1 μm was observed for the interfaces between the BaTiO3 thin films and SUS substrates, as shown in Figure 2b,d.
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Accordingly, the ZnO NRs grow on the FTO substrate, as shown in Figure 3c.
The root of each scale was embedded on the substrate, as shown in Fig. 2a.
PS nanospheres were first deposited as a monolayer on an n-type (100) Si substrate as shown in Figure 1a.
In this condition, the small VG nanosheets are sparsely spread on the substrate as shown in Fig. 2a.
The CNTs were in alignment on the substrate as shown in the cross-sectional view of FESEM images (Fig. 3).
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