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For the aqueous solution sensing applications, Ag@SiO2 substrates are further developed with better sensitivity and selectivity through chemical functionalization.
The resulting polyubiquitinated ERAD substrates are further processed through antagonistic interactions between ufd2 (U-box-containing E4 multiubiquitination enzyme) and ufd3 (WD40 repeat-containing protein) in addition to Otu1 (deubiquitylating enzyme) and/or by Png1 peptide (cytoplasmic peptide: N-glycanase, PNGase -mediated deglycosylation [ 55].
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The cleaned substrates were further treated with UV-ozone to remove the organic residual and enhance the wettability.
Additional covalent bonding of the 5,10,15-tri- p-dodecanoxyphenyl -20- p-hydroxyphenyl -cobalt porphyrin to the silylated substrates was further achieved.
Through a subsequent treatment in the atmosphere of H2 and CH4 after deposition of the composite interlayer, the adhesion of diamond coating on WC Co substrates is further improved.
Then, Si substrates were further cleaned through ultrasonication in acetone and methanol for 3 min.
The as-received STO substrates were polished and cleaned by an organic solution, while the etched substrates were further conducted in buffered HF solutions at room temperature.
The cleaned substrates were further rinsed in deionized water for 10 min and finally deposited by horizontal precipitation Langmuir-Blodgett (HP-LB) method [31].
The growth mechanism of GeSi nanowires on vicinal Si (001) substrates were further clarified, which would help to optimize the growth conditions to obtained desired nanowires.
Moreover, the role of the oxide in the SERS activity of such substrates is further confirmed by the fact that the substrates annealed in inert (nitrogen) atmosphere did not possess noticeable SERS activity.
The interface roughness (IRN) of MQW structures fabricated on these substrates was further analyzed by using Equation 2 [14] 14]: Figure 3 (0002) reflection HRXRD ω/2θ curves of UV-LEDs grown on (a) sapphire and (b) FS-GaN substrates.
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