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The possibility of depositing crystalline VN ultra-thin films at room temperature using a VN target is of great importance for several possible applications where low temperature substrates are employed.
Flat and hard substrates are employed.
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Both free standing films and Pani films deposited on ITO substrates were employed.
Low lattice mismatched γ-LiAlO2 (100) substrates were employed for the epitaxial growth of ZnO by plasma-assisted molecular beam epitaxy.
The substrates were employed for incubation of HETCs and THETCs for 30 min at 37 °C before the adhesion strength measurements.
AgNW transparent electrodes on PET substrates were employed in capacitive pressure sensors.
However, SL yields were mostly lower when different sugars or low-cost substrates were employed, and the cost-reducing effects were inconspicuous compared to SLs obtained from glucose.
For AFM mounting of Candida cells, glass substrates were employed.
A selection of electron-neutral substrates were employed without incident (3 g– j).
When the sterically hindered TMP and dicyclohexylamine substrates were employed, no coupling product was formed (Table 8, entries 1 and 2).
Four additional substrates were employed in which the DNA from only one Hin-DNA cleavage complex can be labeled due to the locations of the EcoR1 sites.
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